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Nano-Food | Nano Bugle

Category Archives: Nano-Food

The “Rule-of-Three”. Admatechs Company Limited (Japan)

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Within this section, Nanobugle will test the 3 main key success factors for the development of new nanotechnology/nanoscience companies.



This week: Japan



1) How was the company born?

Admatechs Company Limited was established in February 1990, jointly by Toyota Motor Corporation and Shin-Etsu Chemical Corporation Limited.

The company name “Admatechs”, is created by combining the initial characters from the company concept “Advanced Material Technologies.”

Admatechs develops advanced materials. The company’s R&D Division is developing several technologies based on VMC combustion technology, for example, coarse particle removal from spherical metal oxide particles, particle surface treatment, and high dispersion of particles.

2) Added value of the products/services

ADMAFINE is the main product developed by Admatechs. It consists of microscopic spherical oxide particles produced by oxidizing metal powders using an original technique known as the VMC method.

The highly specific functionality of spherical particles is used in various fields, including computers, electrical and electronic products, automobiles, foods, and medical equipment. Product examples include, adhesive that optimizes heat conductivity and heat resistance, liquid resin featuring high fluidity and rigidity, and functional paints where heat and weather resistance is required. Each of the ADMAFINE particles maximizes the function of these products and improves the characteristics of the product.

3) Business Strategy

Future business strategy at Admatechs is based in Research and Development. The R&D Division of Admatechs is developing several technologies based on VMC combustion technology, for example, coarse particle removal from spherical metal oxide particles, particle surface treatment, and high dispersion of particles. The company is engaged in a variety of research and development, including basic research to evaluate the rheologic properties of ADMAFINE, applied research, and other research for production engineering.

More information:

Takeshy Yanagihara

Sales and Marketing Development

Admatechs Company Limited

Aichi, Japan




Nanotechnology: a powerful tool for food development

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On May 12th, BIC Galicia organized “What can biotechnology do for the food sector?”. Held at the Campus of Lugo, University of University of Santiago de Compostela, Prof. José Rivas, Director General of the International Iberian Nanotechnology Laboratory (INL), Braga, talked about how nanotechnology may help  to develop new food products.

Prof Rivas remarked that Nanotechnology offers great potential in several sectors like healthcare, materials, energy, cosmetics, or electronics, among others. He also highlighted its possibilities in the food industry.   Here, Nanotechnology can be used for create nanostructure-quality complexes, modify texture, increase consumer acceptability, facilitate nutrients, refine production through process engineering, be applied to colloid technology, create intelligent packaging with nano-antibacterial coatings and allow shelf-life monitoring for safer storage.

Prof Rivas concluded that INL is unique in that not only does it offer the state-of-the-art infrastructure and equipment, but its highly skilled team of experts. They come from a large cross section of sciences, including physicists, chemists, engineers, biologists, and other innovators. This multidisciplinary team approach fosters an entrepreneurial spirit that attracts both visionary entrepreneurs and financial funding entities to drive scientific innovation into everyday products.

INL installs LPX Pegasus ASE, a Deep Silicon Etch (DRIE) with a broad range of challenging applications

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Advanced Silicon Etch (ASE) is a deep reactive ion etching (DRIE) technique used to rapidly etch deep and high aspect ratio structures in silicon.

LPX Pegasus is the continuation of STS’ Advanced Silicon Etch (ASE) technology. Through an in-depth understanding of the Bosch process and with the required hardware, Pegasus is able to provide excellent profile control and selectivity. The increased etch rate and improved uniformity lead to higher throughput and device yield, resulting in increased productivity.

This inductively de-coupled plasma (IDP) system uses fluorine-based gases for anisotropic deep silicon trench etching. The 13.56 MHz RF power supply produces high-density, low-pressure, low-energy plasma. This type of plasma allows high selectivity and aspect ratio etching for depths greater than 150 microns and has an expected etch rate better than 15 microns/ min. Used primarily for MEMs devices, the typical materials used in this etcher are silicon wafers covered with photoresist and thin films of silicon dioxide and silicon nitride.

The performance improvements that Pegasus brings have numerous benefits for research as well as for end users.

At the moment, the tool is being installed in the INL’s facilities and it is expected that the final validation process will take place the first half of May; consequentially, it will be available for both researchers and companies interested in utilizing the technology.

This capability will help us be at the forefront of research in nanotechnology, continue developing new and innovative microdevices for a broad range of challenging applications and research projects.